Physical Properties Of Molybdenum Sputtering Target
Density: 10.2 g/cm3
Melting point: 2610 ℃
Boiling point: 5560 ℃
Molybdenum target purity: 99.9%, 99.99%
Specifications: circular target, plate target, rotating target
Purity: Pure molybdenum ≥ 99.95%, high-temperature molybdenum ≥ 99% (with added rare earth elements)
The Production Process Of Molybdenum Sputtering Target
Molybdenum billets (raw materials) - Inspection - Hot rolling - Alkali washing - Cold rolling - Leveling - Mechanical processing - Inspection - Packaging
Suitable environment for molybdenum materials: vacuum environment or inert gas protection environment, pure molybdenum has a higher resistance to high temperature of 1200 degrees, and molybdenum alloy has a higher resistance to high temperature of 1700 degrees.
Applicable Industries And Uses Of Molybdenum Sputtering Target
Molybdenum target material can be used in electron microscope, solar cell, semiconductor industry, flat panel display, conductive glass
Molybdenum target material can also be used in optical coating, decorative coating , mold coating and other fields. These applications of molybdenum targets benefit from their unique physical and chemical properties, such as high melting point, good electrical conductivity and thermal stability, as well as their resistance to high temperatures and corrosive environments.
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